Symposium C
4th Asian Nanoimprint Lithiography Symposium (ASNIL)
Chairs
Hong Yee LOW, Institute of Materials Research and Engineering, Singapore
Shinji MATSUI, University of Hyogo, Japan Science and Technology Agency - Core Research for Evolutional Science and Technology, Japan
Co-Chairs
M. S. M. SAIFULLAH, Institute of Materials Research and Engineering, Singapore
Eung-Sug LEE, Korea Institute of Machinery and Materials, South Korea
Yoshihiko HIRAI, Osaka Prefecture University, Japan
Correspondence
Jaslyn LAW, Institute of Materials Research and Engineering, Singapore Email: lawj@imre.a-star.edu.sg Tel: 68727746 Fax: 67742633 Mailing Address: Institute of Materials Research and Engineering 3 Research Link Singapore 117602
Scope of Symposium
Asian Nanoimprint Lithography (ASNIL) symposium is an annual meeting started in 2008, first held in Korea, then Taiwan, while the 3rd was recently held in Japan. The symposium brings together R&D communities from the Asia Pacific countries, with dedicated interests on nanoimprint technology. The committee consists of representatives from Japan, Korea, Taiwan and Singapore. On the other hand, an annual industrial symposium on nanoimprint technology is started in Singapore since 2007, which has emphasis on industrial applications of nanoimprint technology. It is an opportunity to create synergy by hosting the 4th ASNIL meeting and the 5th industrial symposium in a single event. Chair of Asian NIL committee: Dr. Masanori KOMURO, NEDO, Japan
Vice-chair of Asian NIL committee: Prof. Shinji MATSUI, U.Hyogo, Japan Dr. Eung-Sung LEE, KIMM, Korea Dr. Jen-Hui TSAI, ITRI, Taiwan Dr. Hong Yee LOW, IMRE, Singapore
Chair of symposium: Prof. Shinji MATSUI, U.Hyogo, Japan Dr. Hong Yee LOW, IMRE, Singapore
Co-chairs of symposium: Dr. Ryutaro MAEDA, AIST, Japan Dr. Hiroshi HIROSHIMA, AIST, Japan Prof. Yoshihiko HIRAI, Osaka Pref. U., Japan Dr. Eung-Sung LEE, KIMM, Korea Dr. Jun-Ho JEONG, KIMM, Korea Prof. Fuh-Yu CHANG, NTUST, Taiwan Dr. M.S.M. SAIFULLAH, IMRE, Singapore Dr. Jaslyn LAW, IMRE, Singapore
The scope of the symposium covers the entire value chain of nanoimprint technology: tool, material, template, process simulation and development as well as applications. Other topics traditionally covered by this symposium are nanoprint, soft-lithography and dip-pen lithography. The 4th Asian Nanoimprint Lithography Symposium will incorporate the annual Singapore-based industrial symposium on Nanoimprint Technology so that it will be a unique blend of both the academic and industrial participations. We would like to invite abstracts from both the academic and the industrial communities.
Invited Speakers
Ta-Hsin CHOU, Industrial Technology Research Institute,
